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专利名称：Gas temperature control for a plasma
process
发明人：Maolin Long申请号：US10173671申请日：20020619公开号：US06811651B2公开日：20041102
专利附图：
摘要：A method and system for controlling the temperatures of at least one gas in aplasma processing environment prior to the at least one gas entering a process chamber.This temperature control may vary at different spatial regions of a showerhead assembly
(either an individual gas species or mixed gas species). According to one embodiment, anin-line heat exchanger alters (i.e., increases or decreases) the temperature of passing gasspecies (either high- or low-density) prior to entering a process chamber, temperaturechange of the gases is measured by determining a temperature of the gas both uponentrance into the in-line heat exchanger assembly and upon exit.
申请人：TOKYO ELECTRON LIMITED
代理机构：Oblon, Spivak, McClelland, Maier & Neustadt, P.C.
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